Design and fabrication of 2D-grating used in a multi-dimension measurement system
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https://doi.org/10.54939/1859-1043.j.mst.FEE.2022.138-145Keywords:
2D-Grating; Precision Measurement; Precision Fabrication.Abstract
Long-period 2D-gratings has many critical applications, especially in the precision measurement system. The photography grating fabrication methods still encounter some problems with the exposure system when fabricating this type of grating. In this paper, we present a process from research to design and fabrication of a 5 μm-period 2D-grating used in a multi-dimension measurement system. Therein, we use ETA software and based on using requirements, fabricating level to design and select parameters of grating detailed. Then, we proposed a novel exposure system to solve the problem of the traditional systems encountered when fabricated long-period gratings. Through the analysis and calculation, we adjust the system to optimize interference aberration, thereby optimizing the spacing errors. The fabrication result has conformed with the design and the spacing error achieved to 0.03 λ within 65 mm × 65 mm of aperture, other parameters of grating all meet the requirements.
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[3]. H. Hsieh, Pan S, “Three-degree-of-freedom displacement measurement using grating-based heterodyne interferometry,” Appl. Opt., Vol. 52, No. 27, 6840–6848, (2013). DOI: https://doi.org/10.1364/AO.52.006840
[4]. X. Li et al, “A six-degree-of-freedom surface encoder for precision positioning of a planar motion stage ,” Precis. Eng., Vol. 37, No. 3, 771–781, (2013). DOI: https://doi.org/10.1016/j.precisioneng.2013.03.005
[5]. C. C. Nshii et al, “A surface-patterned chip as a strong source of ultracold atoms for quantum technologies,” Nat. Nanotechnol, Vol. 8, 321–324, (2013). DOI: https://doi.org/10.1038/nnano.2013.47
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[7]. D. Lin et al, “High stability multiplexed fiber interferometer and its application on absolute displacement measurement and on-line surface metrology,” Opt. Express, Vol.12, No.23, 5729, (2004). DOI: https://doi.org/10.1364/OPEX.12.005729
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[9]. G. Dai et al, “Metrological large range scanning probe microscope,” Rev. Sci. Instrum., Vol.75, No.4, 962–970, (2004). DOI: https://doi.org/10.1063/1.1651638
[10]. J. C. Montoya et al, “Doppler writing and linewidth control for scanning beam interference lithography,” J. Vac. Sci. Technol. B Microelectron Nanom. Struct., Vol.23, No.6, 2640–2645, (2005). DOI: https://doi.org/10.1116/1.2127938
[11]. H. Hsieh et al, “Two-dimensional displacement measurement by quasi-common-optical-path heterodyne grating interferometer,” Opt. Express, Vol.19, No.10, 185–191, (2011). DOI: https://doi.org/10.1364/OE.19.009770
[12]. K. C. Fan et al, “Displacement measurement of planar stage by diffraction planar encoder in nanometer resolution,” 2012 IEEE I2MTC – Int. Instrum. Meas. Technol Conf Proc (2012), 894–897.
[13]. W. Gao W, A. Kimura, “A Three-axis Displacement Sensor with Nanometric Resolution,” CIRP Ann. – Manuf. Technol., Vol.56, No.1, 529–532, (2007). DOI: https://doi.org/10.1016/j.cirp.2007.05.126
[14]. 王世玮, “计量用二维光栅像差和衍射效率的优化及制作”. 北京：清华大学，(2016).
[15]. V. H. Wolferen, “Abelmann L. Laser interference lithography”. Hennessy T C. Lithography: Principles, Processes and Materials. Netherlands: Nova Science Publishers, Inc, (2011) p. 133–148.
[16]. M. E. Walsh, “On the design of lithographic interferometers and their application”. Massachusetts: Massachusetts Institute of Technology, (2004).
[17]. S. Zhou et al, “Dual-comb spectroscopy resolved three-degree-of-freedom sensing,” Photon. Res., Vol.9, 243-251, (2021). DOI: https://doi.org/10.1364/PRJ.412898
[18]. L. Li, “Fourier Modal Method Gratings”, in Chap. 13 of Grating: Theory and Numeric Applications, 2nd rev. ed. Ed. Popov. E (2014).
[19]. V. Le et al, “A single collimating lens based dual-beam exposure system for fabricating long-period grating,” Opt. Commun., Vol.460, 125139, (2020). DOI: https://doi.org/10.1016/j.optcom.2019.125139
