Treatment of wastewater from nitromas production line using UV-Fenton process combined with micro algae Chlorella vulgaris

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Authors

  • Vu Thi Vui Institute of New Technology, Academy of Military Science and Technology
  • Nguyen Ha Trung Institute of New Technology, Academy of Military Science and Technology
  • Le Thuy Duong Institute of New Technology, Academy of Military Science and Technology
  • Tran Thi Trang Hung Yen University of Technology and Education
  • Pham Son Tung (Corresponding Author) Institute of New Technology, Academy of Military Science and Technology

DOI:

https://doi.org/10.54939/1859-1043.j.mst.90.2023.102-109

Keywords:

Nitromas; UV/Fenton; Chlorella vulgaris.

Abstract

In this study, wastewater from the Nitromas production line was treated with a UV/Fenton system to remove organic recalcitrant contaminants. Wastewater after treatment is used to grow the microalgae Chlorella vulgaris while removing nitrate nutrients. After UV/Fenton process with different ratios for 120 minutes, COD removal efficiency and Dinitrotoluen (DNT) removal efficiency reached 81,40% and 89,11%, respectively, at C0(DNT) = 10 mg/L, pH = 3, UV lamp λ = 254 nm power 6W by using Fe2+ with concentration of 10,0x10-3 M and the ratio H2O2/Fe2+ = 30. Wastewater after AOPs treatment was put into microalgae container to create nitrate concentrations of 270 mg/L, 160 mg/L, and 90 mg/L và 60 mg/L, respectively. The results showed that, after 14 days of microalgae growing well in wastewater with CNO3- = 160 mg/L, with a nitrate removal efficiency of 41,01%. Experimental results show that UV/Fenton can be combined with microalgae Chlorella Vulgaris to treat wastewater containing persistent organic components.

References

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Published

25-10-2023

How to Cite

Vũ, T. V., H. T. Nguyễn, T. D. Lê, Trần Thị Trang, and S. T. Phạm. “Treatment of Wastewater from Nitromas Production Line Using UV-Fenton Process Combined With Micro Algae Chlorella Vulgaris”. Journal of Military Science and Technology, vol. 90, no. 90, Oct. 2023, pp. 102-9, doi:10.54939/1859-1043.j.mst.90.2023.102-109.

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